Succinic acid
Succinic acid
110-15-6
disodium succinate
Phthalocyanine pigment
Compound dyes
Compound green
Composite blue
Etching composition and etching process in succinic acid(cas:110-15-6)
Release time:2016/8/12 17:12:35


Etching composition and etching process in succinic acid. An etching composition which comprises at least one organic carboxylic acid compound selected from acetic acid, propionic acid, butyric acid, succinic acid(cas:110-15-6), citric acid, lactic acid, malic acid, tartaric acid, malonic acid, maleic acid, glutaric acid, aconitic acid, 1,2,3-propanetricarboxylic acid and ammonium salts of these acids, a polysulfonic acid compound and water, and an etching process which comprises etching a conductive film comprising zinc oxide as the main component using the etching composition described above.


1. An etching process with comprises etching a conductive film comprising zinc oxide as a main component using an etching composition, said etching composition comprising a polysulfonic acid compound, water, and at least one organic carboxylic acid compound selected from the group consisting of acetic acid, propionic acid, butyric acid, succinic acid(cas:110-15-6), citric acid, lactic acid, malic acid, tartaric acid, malonic acid, maleic acid, glutaric acid, aconitic acid, 1,2,3-propanetricarboxylic acid and ammonium salts of these acids.


2. The etching process according to claim 1, wherein a concentration of the polysulfonic acid compound is 0.0001 to 10% by weight.

3. The etching process according to claim 1, wherein the conductive film also comprises at least one of aluminum and gallium.

4. The etching process according to claim 1, wherein the organic carboxylic acid compound is selected from the group consisting of acetic acid, citric acid, succinic acid(cas:110-15-6), lactic acid, malic acid and tartaric acid, and ammonium salts thereof.

5. The etching process according to claim 1, wherein the ammonium salt is selected from the group consisting of ammonium acetate and ammonium succinate.

6. The etching process according to claim 1, wherein the polysulfonic acid compound is a compound selected from the group consisting of condensation products of naphthalenesulfonic acid with formalin, ligninsulfonic acid, polystyrenesulfonic acid and salts of these compounds.

7. The etching process according to claim 6, wherein the condensation product of naphthalenesulfonic acid with formalin is a compound obtained by sulfonation using naphthalene and sulfuric acid, followed by condensation by addition of formalin or by condensation by addition of formalin and neutralization with an alkali.

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